Arbeiten, die aktuell zu vergeben sind

Bereich Technologie:

 - Master‘s thesis: Improvement of etching depth accuracy and reduction of RIE lag for shallow etches in silicon using the Oxford Cluster Etcher

- Bachelor’s thesis / Master’s thesis: Investigation of minimum feature size and process bias in optical lift-off processes

- Master‘s thesis: Evaluation and comparison of different approximation algorithms for variable-shaped electron beam writing

- Bachelor's/Master‘s thesis: Analysis and optimization of our electron beam cell projection capabilities for the approximation of complex patterns

- Bachelor‘s thesis / Student research project: Characterization and optimization of e-beam resists for specific purposes

- Bachelor‘s thesis / Student research project: Exposed optical waveguides for analysis of liquid or gaseous media

- Bachelor‘s thesis / Student research project: Optimization of sputter deposition processes for AlSi (metallization) or TiN (resistive/dielectric layer)

Bereich Systeme:

- Master’s thesis: Design and analysis of AlGaN/GaN high electron mobility transistor (HEMT) structure with source field-plate (SFP) for high-voltage power electronics applications

- Master’s thesis / Student research project: Characterization of an on-chip near-infrared spectrometer with a focus on bio-medical application